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The Waterborne Symposium

Posted in: February 3, 2021

Juliane Pereira, R&D Specialist for Coatings at Oxiteno, will present the Sidney Lauren Memorial Lecture “Improving Water Resistance of Waterborne Coatings” at The Waterborne Symposium, on February 10, 2021.

About the talk
Sidney Lauren Memorial Lecture: “Improving Water Resistance of Waterborne Coatings”
https://www.waterbornesymposium.com/

Speaker: Juliane Pereira, R&D Specialist for Coatings

Date: February 10, 2021

Time: 8:30am – 9:00am CST

Abstract:
Improve the water resistance of waterborne coatings is essential for developing coatings with better barrier properties and longer durability. In this presentation some approaches for improving the water resistance of waterborne coatings will be presented.
One approach is the use of Hansen Solubility Parameter (HSP) in order to design and develop additives more compatible with latexes used in waterborne coatings.
Another approach shows the importance of film formation, in special coalescence, on water resistance of waterborne coatings.
Based on these two approaches, a new low VOC coalescent was developed and AFM images demonstrate its efficiency for generating coalesced films of styrene-acrylic latex.
Paints formulated with the styrene-acrylic latex and the new low VOC coalescent presented superior wet scrub resistance in comparison to the ones formulated with the same latex and a benchmark high VOC coalescent.
Another important approach consists in decreasing the content of free surfactant within the coatings replacing at least part of the conventional surfactants used in the emulsion polymerization with reactive surfactants.
Styrene-acrylic latexes polymerized with a conventional APE-free anionic surfactant and experimental reactive APE-free non-ionic surfactants have high shear and electrolytic stabilities.
Semi-gloss paints formulated with those latexes and the new low VOC coalescent presented wet scrub resistance up to 70 % higher than the ones formulated with the styrene-acrylic latex benchmark in water resistance.